Products Laser Machines 3D Laser Lithography Machine nSCULPTOR
3D Laser Lithography Machine nSCULPTOR

nSCULPTOR is a turnkey 3D laser lithography system for fabrication of nano structures. Operation of the system is based on multi photon polymerization (mPP) technique and works with many conventional photoresists available in the market. nSCULPTOR enables prototyping and production of various three-dimensional structures at nanometer accuracy and resolution.

All processes of fabrication are integrated into a single system

• 3D model creation and preparation
• Direct laser writing
• Post-processing

System features

• All-in-one solution
• 100 nm – 10 μm resolution
• Complex 3D objects
• Variety of polymers
• Small footprint

3D model preparation for laser lithography

System is controlled by SCA laser micromachining software. Simple 3D models can be prepared in SCA itself.
In addition, 3D model can be prepared in designer software e.g. Autodesk AutoCAD and then imported to SCA. This way, designers work in their already convenient environment. SCA supports *.stl, *.dxf formats for 3D fabrication.
When imported to SCA, models are prepared for 3D laser lithography. They can be sliced, hatched etc. so that all volume or only outer shape of the object would be fabricated.

Direct laser writing

3D polymerization process is performed by femtosecond laser source, precise 3 axes positioning stages and galvoscanners.
First, the desired pattern is “written” from CAD design by precise positioning of the laser focal point in the photoresist. Two-photon or multiphoton absorption in polymers is used to form 3D structures with high surface quality. Object is formed from <100 nm self-forming structures and 200nm to 10 μm size controllable and repeatable features. Nanometer resolution and broad selection of polymers extends applications of this technique to micro-optics, scaffolds, micro-fluidics, MOEMS, functional surfaces and much more.
After the 3D structure is formed identically to the CAD design, the unsolidified remainder of the photoresist is washed away by means of an organic solvent, leaving only the newly fabricated microstructures on the substrate.

Post-processing

After desired structure is formed it is submerged in several different solvents to remove liquid polymer left after fabrication. All process is fully automated and necessary parameter can be set according to the requirements: times of submersion, temperatures, etc.
For specific cases objects can be additionally treated with UV light or critical point dryer.

Application fields

• Nanophotonic devices (3D photonic crystals)
• Microfluidics
• Microoptics (lenses, structures on an optical fiber tip, etc.)
• Micromechanics
• Micro-Opto-Electromechanical Systems (MOEMS)
• Biomedicine